DESCRIPTION: | MOCVD Epitaxy System, Maker Taiyo Nippon Sanso, Model HR4469G, S/N 15Q188A-00, YoM 2023;
The HR4469G is a high-performance MOCVD system designed for epitaxial growth of III-V
compound semiconductors. It is equipped with a horizontal reactor for processing one
4-inch wafer under reduced pressure.
The system integrates gas supply, heating, vacuum exhaust, safety interlock, and
computer-based control systems. |